ちゅうにゅう
イオン注入
1. ion implantation
2. Ion implantationIon implantation is a materials engineering process by which ions of a material are accelerated in an electrical field and impacted into a solid. This process is used to change the physical, chemical, or electrical properties of the solid. Ion implantation is used in semiconductor device fabrication and in metal finishing, as well as various applications in materials science research.
Read “Ion implantation” on English Wikipedia
Read “イオン注入” on Japanese Wikipedia
Read “Ion implantation” on DBpedia
Read “Ion implantation” on English Wikipedia
Read “イオン注入” on Japanese Wikipedia
Read “Ion implantation” on DBpedia
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