イオンプレーティング
1. Ion platingIon plating is a physical vapor deposition (PVD) process that is sometimes called ion assisted deposition (IAD) or ion vapor deposition (IVD) and is a version of vacuum deposition. Ion plating utilizes concurrent or periodic bombardment of the substrate and depositing film by atomic-sized energetic particles. Bombardment prior to deposition is used to sputter clean the substrate surface. During deposition the bombardment is used to modify and control the properties of the depositing film.
Read “Ion plating” on English Wikipedia
Read “イオンプレーティング” on Japanese Wikipedia
Read “Ion plating” on DBpedia
Read “Ion plating” on English Wikipedia
Read “イオンプレーティング” on Japanese Wikipedia
Read “Ion plating” on DBpedia
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