ケイ酸ハフニウム(IV)
1. Hafnium(IV) silicateHafnium silicate is the hafnium(IV) salt of silicic acid with the chemical formula of HfSiO4. Thin films of hafnium silicate and zirconium silicate produced by chemical vapor deposition, most often MOCVD, can be used as a high-k dielectric as a replacement for silicon dioxide in semiconductors.
Read “Hafnium(IV) silicate” on English Wikipedia
Read “ケイ酸ハフニウム(IV)” on Japanese Wikipedia
Read “Hafnium(IV) silicate” on DBpedia
Read “Hafnium(IV) silicate” on English Wikipedia
Read “ケイ酸ハフニウム(IV)” on Japanese Wikipedia
Read “Hafnium(IV) silicate” on DBpedia
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