プラズマCVD
1. Plasma-enhanced chemical vapor depositionPlasma-enhanced chemical vapor deposition (PECVD) is a process used to deposit thin films from a gas state to a solid state on a substrate. Chemical reactions are involved in the process, which occur after creation of a plasma of the reacting gases. The plasma is generally created by RF frequency or DC discharge between two electrodes, the space between which is filled with the reacting gases.
Read “Plasma-enhanced chemical vapor deposition” on English Wikipedia
Read “プラズマCVD” on Japanese Wikipedia
Read “Plasma-enhanced chemical vapor deposition” on DBpedia
Read “Plasma-enhanced chemical vapor deposition” on English Wikipedia
Read “プラズマCVD” on Japanese Wikipedia
Read “Plasma-enhanced chemical vapor deposition” on DBpedia
Discussions
Log in to talk about this word.