容量結合プラズマ
1. Capacitively coupled plasmaA capacitively coupled plasma (CCP) is one of the most common types of industrial plasma sources. It essentially consists of two metal electrodes separated by a small distance, placed in a reactor. The gas pressure in the reactor can be lower than atmosphere or it can be atmospheric. A typical CCP system is driven by a single radio-frequency (RF) power supply, typically at 13.56 MHz. One of two electrodes is connected to the power supply, and the other one is grounded.
Read “Capacitively coupled plasma” on English Wikipedia
Read “容量結合プラズマ” on Japanese Wikipedia
Read “Capacitively coupled plasma” on DBpedia
Read “Capacitively coupled plasma” on English Wikipedia
Read “容量結合プラズマ” on Japanese Wikipedia
Read “Capacitively coupled plasma” on DBpedia
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